Volume 26; Issue 16

Polymer Engineering & Science

Volume 26; Issue 16
1

Masthead

Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 88 KB
english, 1986
2

Guest editor's message

Ph. D., F. A. I. C. Maung S. Htoo
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 72 KB
english, 1986
7

A molded deep-UV portable conformable masking system

B. J. Lin, V. W. Chao, K. E. Petrillo, B. J. L. Yang
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 553 KB
english, 1986
11

Spun-On contour coating characterizations for advanced optical lithography

L. K. White
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 509 KB
english, 1986
12

Submicron lithography in Japan

Kyoichi Shibayama, Tadao Kato
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 870 KB
english, 1986
13

Limits of optical lithography

Janusz S. Wilczynski
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 61 KB
english, 1986
14

Excimer laser projection patterning with and without resists

D. J. Ehrlich
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 210 KB
english, 1986
17

Optimal developer selection for negative acting resists

A. E. Novembre, L. M. Masakowski, M. A. Hartney
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 1.44 MB
english, 1986
18

The reduction of reflective notches using “dyed” resist

Michael P. C. Watts, David Debruin, William H. Arnold
Journal:
Polymer Engineering & Science
Year:
1986
Language:
english
File:
PDF, 1.06 MB
english, 1986