Thermally induced strain relaxation in SiGe/Si heterostructures with low-temperature buffer layers
V. I. Vdovin, T. G. Yugova, M. M. Rzaev, F. Schäffler, M.G. Mil'vidskiiVolume:
2
Year:
2005
Language:
english
Pages:
5
DOI:
10.1002/pssc.200460529
File:
PDF, 307 KB
english, 2005