![](/img/cover-not-exists.png)
Fabrication of thick AlN film by low pressure hydride vapor phase epitaxy
Yu-Huai Liu, Tomoaki Tanabe, Hideto Miyake, Kazumasa Hiramatsu, Tomohiko Shibata, Mutsuhiro TanakaVolume:
3
Year:
2006
Language:
english
Pages:
4
DOI:
10.1002/pssc.200565355
File:
PDF, 353 KB
english, 2006