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Depth profiling of ion-implanted AlInN using time-of-flight secondary ion mass spectrometry and cathodoluminescence
R. W. Martin, D. Rading, R. Kersting, E. Tallarek, E. Nogales, D. Amabile, K. Wang, V. Katchkanov, C. Trager-Cowan, K. P. O'Donnell, I. M. Watson, V. Matias, A. Vantomme, K. Lorenz, E. AlvesVolume:
3
Year:
2006
Language:
english
Pages:
4
DOI:
10.1002/pssc.200565411
File:
PDF, 288 KB
english, 2006