Impact of Al2O3 incorporation on device performance of HfO2...

Impact of Al2O3 incorporation on device performance of HfO2 gate dielectric AlGaN/GaN MIS-HFETs

Feng Tian, Eng Fong Chor
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Volume:
7
Year:
2010
Language:
english
Pages:
3
DOI:
10.1002/pssc.200983452
File:
PDF, 158 KB
english, 2010
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