Deactivation of phosphorus in silicon due to implanted...

Deactivation of phosphorus in silicon due to implanted nitrogen

Chang, Ruey-Dar, Lin, Chih-Hung
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Volume:
11
Language:
english
Journal:
physica status solidi (c)
DOI:
10.1002/pssc.201300131
Date:
January, 2014
File:
PDF, 400 KB
english, 2014
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