Resistivity changes of low resistivity Si substrates by rapid thermal processing and subsequent annealing
Zhang, X., Ma, X., Gao, C., Xu, T., Zhao, J., Dong, P., Vanhellemont, J.Volume:
11
Language:
english
Journal:
physica status solidi (c)
DOI:
10.1002/pssc.201300107
Date:
January, 2014
File:
PDF, 183 KB
english, 2014