Thermal annealing effects on the stress stability in silicon dioxide films grown by plasma-enhanced chemical vapor deposition
Fu, Jianyu, Shang, Haiping, Li, Zhigang, Wang, Weibing, Chen, DapengVolume:
23
Language:
english
Journal:
Microsystem Technologies
DOI:
10.1007/s00542-016-3005-1
Date:
July, 2017
File:
PDF, 1.09 MB
english, 2017