Spin-on Trilayer Approaches to High NA 193nm Lithography

Journal of Photopolymer Science and Technology 2007 Vol. 20; Iss. 5

Spin-on Trilayer Approaches to High NA 193nm Lithography

Abdallah, D. J., Mckenzie, D., Timko, A., Dioses, A., Houlihan, F., Rahman, D., Miyazaki, S., Zhang, R., Kim, W., Wu, H., Pylneva, L., Lu, P-H., Nisser, M., Dammel, R. R.
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Volume:
20
Year:
2007
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.20.697
File:
PDF, 482 KB
english, 2007
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