Volume 20; Issue 5

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Journal of Photopolymer Science and Technology
Volume 20; Issue 5

Journal of Photopolymer Science and Technology

Volume 20; Issue 5

1

Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography

Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 1.35 MB

english, 2007

2

Spin-on Trilayer Approaches to High NA 193nm Lithography

Abdallah, D. J., Mckenzie, D., Timko, A., Dioses, A., Houlihan, F., Rahman, D., Miyazaki, S., Zhang, R., Kim, W., Wu, H., Pylneva, L., Lu, P-H., Nisser, M., Dammel, R. R.

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 482 KB

english, 2007

3

Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Zimmerman, Paul A., Peski, Chris van, Rice, Bryan, Byers, Jeff, Turro, Nicholas J., Lei, Xuegong, Gejo, Juan Lopez, Liberman, Vladmir, Palmacci, Steve, Rothchild, Mordy, Whitker, Andrew, Blakey, Idris

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 644 KB

english, 2007

4

Bubbles Condensed at Water/resist Interface analyzed by AFM

Kawai, Akira, Suzuki, Kenta

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 635 KB

english, 2007

5

Design of Sulfonium Compounds as a Photo-acid Generator

Tsuchimura, Tomotaka, Shimada, Kazuto, Ishiji, Youhei, Matsushita, Tetsunori, Aoai, Toshiaki

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 404 KB

english, 2007

6

Oxime Sulfonate Chemistry for Advanced Microlithography

Yamamoto, Hitoshi, Asakura, Toshikage, Nishimae, Yuichi, Matsumoto, Akira, Tanabe, Junichi, Birbaum, Jean-Luc, Murer, Peter, Hinterman, Tobias, Ohwa, Masaki

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 685 KB

english, 2007

7

Novel Ionic Photoacid Generators (PAGs) and Corresponding PAG Bound Polymers

Wang, Mingxing, Yueh, Wang, Gonsalves, Kenneth E.

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 364 KB

english, 2007

8

Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group

Igarashi, Hiroyuki, Igarashi, Tsutomu, Sagawa, Minoru, Mori, Toru, Kotani, Yuzo, Muroya, Yusa, Katsumura, Yosuke, Yamashita, Takashi

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 380 KB

english, 2007

9

Current Status of High-n Immersion Lithography Development

Sewell, Harry, Mulkens, Jan, Wagner, Christian, McCafferty, Diane, Markoya, Louis, Lipson, Matthew, Samarakone, Naundasiri

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 647 KB

english, 2007

10

Design Consideration for Immersion 193: Embedded Barrier Layer and Pattern Collapse Margin

Wang, Deyan, Caporale, Stefan, Audes, Cecily, Cheon, Kap-Soo, Xu, Cheng Bai, Trefonas, Peter, Barclay, George

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 965 KB

english, 2007

11

Double Exposure Materials: Simulation Study of Feasibility

Byers, Jeffrey, Lee, Saul, Jen, Kane, Zimmerman, Paul, Turro, Nicholas, Willson, C. Grant

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 758 KB

english, 2007

12

Novel Diamantane Polymer Platform for Resist Applications

Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takay

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 727 KB

english, 2007

13

Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water

Tran, Hoang, French, Roger H., Adelman, Douglas J., Feldman, Jerald, Qiu, Weiming, Wheland, Robert C., Brubaker, Luke W., Fischel, Brian E., Fones, Barbara B., Lemon, Michael F., Yang, Min K., Nagao,

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 1.28 MB

english, 2007

14

Color Imaging Lithography of a Two Photon Absorption Dye Using Chemically Amplified Reaction

Yamashita, Takashi, Nakatoh, Yosuke

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 376 KB

english, 2007

15

Free Volume Distribution and Local Environment of a Polymer with Photo-reactive Probe Technique

Yamashita, Takashi, Ishii, Kuniyoshi, Hasegawa, Mayu

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 166 KB

english, 2007

16

Rational Design of High-RI Resists for 193nm Immersion Lithography

Whittaker, Andrew K., Blacey, Idriss, Chen, Lan, Dagaville, Bronwin, Liu, Heping, Conley, Will, Zimmerman, paul A.

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 581 KB

english, 2007

17

Synthesis and Optical Properties of EB Induced Refractive Index Lithography materials Based on Aliphatic Polyimides

Yamashita, Takashi, Ogawara, Mutuki, Koshikawa, Hiroshi, Maekawa, Yasunari

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 283 KB

english, 2007

18

Preparation of Transparent Polyimides and Their Photoinduced Charge Transfer

Yamashita, Takashi, Miura, Toru

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 243 KB

english, 2007

19

Pattern Transfer of Laterally Aligned Lamellar Domains of Diblock Copolymers

Yamaguchi, Toru, Yamaguchi, Hiroshi

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 401 KB

english, 2007

20

Non-ionic Photoacid Generators Sensitive to 365nm Light-Synthesis and Applications to Photocrosslinking Systems-

Shirai, Masamitsu

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 435 KB

english, 2007

21

Trilayer Development for 193nm Immersion Lithography

Burns, Sean, Burkhardt, Martin, Goldfarb, Dario, Lustig, Naftali, Pfeiffer, Dirk, Brodsky, Mary Jane, Clancy, Alexandra, Medeiros, David

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 607 KB

english, 2007

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