Evaluation of the Outgassing from Resists at the EUV...

Journal of Photopolymer Science and Technology 2001 Vol. 14; Iss. 4

Evaluation of the Outgassing from Resists at the EUV Wavelength.

Irie, Shigeo, Oizumi, Hiroaki, Nishiyama, Iwao, Shirayone, Shigeru, Ryoo, Manhyoung, Yamanashi, Hiromasa, Yano, Ei, Okazaki, Shinji
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Volume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.561
File:
PDF, 666 KB
english, 2001
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