Volume 14; Issue 4

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Journal of Photopolymer Science and Technology
Volume 14; Issue 4

Journal of Photopolymer Science and Technology

Volume 14; Issue 4

1

Novel Fluoropolymers for Use in 157nm Lithography.

Ito, H., Wallraff, G. M., Fender, N., Brock, P. J., Larson, C. E., Truong, H. D., Breyta, G., Miller, D. C., Sherwood, M. H., Allen, R. D.

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.77 MB

english, 2001

2

Fundamental Studies of Acid-Breakable Resins for Chemical-Amplification Positive Resist Matrices.

Arai, Tadashi, Migitaka, Sonoko, Sakamizu, Toshio, Kasuya, Kei, Hashimoto, Michiaki, Shiraishi, Hiroshi

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.25 MB

english, 2001

3

Evaluation of the Outgassing from Resists at the EUV Wavelength.

Irie, Shigeo, Oizumi, Hiroaki, Nishiyama, Iwao, Shirayone, Shigeru, Ryoo, Manhyoung, Yamanashi, Hiromasa, Yano, Ei, Okazaki, Shinji

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 666 KB

english, 2001

4

The Status of 157nm Lithography Development.

Dean, Kim R., Peski, Chris van, Kim, Hyeong Soo, Hien, Stefan, Owe-Yang, D.C., Conley, Will

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.93 MB

english, 2001

5

Considerations for the Deep X-ray Lithography with the SU-8 Resist.

Singleton, Laurence, Kufner, Maria, Megtert, Stephan

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.89 MB

english, 2001

6

Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.

Kuebler, Stephen M., Rumi, Mariacristina, Watanabe, Toshiyuki, Braun, Kevin, Cumpston, Brian H., Heikal, Ahmed A., Erskine, Lael L., Thayumanavan, S., Barlow, Stephen, Marder, Seth R., Perry, Joseph W

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 2.74 MB

english, 2001

7

Adhesion and Cohesion Analysis of ArF/SOR Resist Patterns with Microtip of Atomic Force Microscope(AFM).

Kawai, Akira, Moriike, Norio

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.05 MB

english, 2001

8

Suppression of Pattern Edge Roughness by Low Ion Strength Developer.

Kumada, Teruhiko, Sumitani, Hiroaki, Matsui, Yasuji

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 962 KB

english, 2001

9

Multiple Anion Nonvolatile Acetal(MANA) Resists.

Brainard, Robert L., Guevremont, Jeffrey M., Reeves, Scott D., Zhou, Xin, Nguyen, Thinh B., Mackevich, Joseph F., Taylor, Gary N., Anderson, Erik H.

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 2.16 MB

english, 2001

10

Improved Sensitivity of Multi-adduct Derivatives of Fullerene.

Tada, Tetsuya, Uekusa, Koichiro, Kanayama, Toshihiko, Nakayama, Takahiro, Chapman, Ross, Cheung, Wai Yee, Eden, Louise, Hussain, Irfan, Jennings, Mark, Perkins, Jacob, Phillips, Marcus, Preece, Jon A.

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 713 KB

english, 2001

11

Image Formation in Electron Projection and E-beam Direct Write Lithography Resists.

Ocola, L.E., Blakey, M.I., Orphanos, P.A., Li, W.-Y., Kasica, R. J., Novembre, A. E.

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.64 MB

english, 2001

12

Fine Pattern Replication by EUV Lithography.

Hamamoto, Kazuhiro, Watanabe, Takeo, Tsubakino, Harushige, Kinoshita, Hiroo, Shoki, Tsutomu, Hosoya, Morio

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 2.48 MB

english, 2001

13

New Resin Systems for 157nm Lithography.

Dammel, Ralph R., Sakamuri, Raj, Kudo, Takanori, Romano, Andrew, Rhodes, Larry, Vicari, Richard, Hacker, Cheryl, Conley, Will, Miller, Daniel

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 2.18 MB

english, 2001

14

Rejuvenation of 248nm Resist Backbones for 157nm Lithography.

Bae, Young C., Douki, Katsuji, Yu, Tianyue, Dai, Junyan, Schmaljohann, Dirk, Kang, Seok Ho, Kim, Keon Hyeong, Koerner, Hilmar, Conley, Will, Miller, Daniel, Balasubramanian, Raghu, Holl, Susan, Ober,

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.94 MB

english, 2001

15

Study of SILYAL Process for 157-nm Lithography.

Watanabe, M., Watanabe, H., Satou, I., Itani, T.

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 970 KB

english, 2001

16

Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope(AFM.)

Kawai, Akira, Abe, Takato

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.16 MB

english, 2001

17

Resist Outgassing by EUV Irradiation.

Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo, Tsubakino, Harushige, Hada, Hideo, Komano, Hiroshi, Endo, Masayuki, Sasago, Masaru

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.04 MB

english, 2001

18

The Resist Property of Fluoropolymer for 157-nm Lithography.

Ishikawa, Seiichi, Toriumi, Minoru, Miyoshi, Seiro, Naito, Takuya, Yamazaki, Tamio, Watanabe, Manabu, Itani, Toshio

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1024 KB

english, 2001

19

157nm Single-Layer and Bilayer Resists Based on .ALPHA.-Methylstyrene Polymers.

Shirai, Masamitsu, Shinozuka, Toyofumi, Okamura, Haruyuki, Tsunooka, Masahiro, Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.70 MB

english, 2001

20

Materials and Resists for 193 and 157nm Applications.

Padmanaban, Munirathna, Alemy, Eric, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Masuda, Seiya, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 4.73 MB

english, 2001

21

Fluoropolymer Resist Materials for 157nm Microlithography.

Tran, Hoang V., Hung, Raymond J., Chiba, Takashi, Yamada, Shintaro, Mrozek, Thomas, Hsieh, Yu-Tsai, Chambers, Charles R., Osborn, Brian P., Trinque, Brian C., Pinnow, Matthew J., Sanders, Daniel P., C

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 992 KB

english, 2001

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