Oxime Sulfonate Chemistry for Advanced Microlithography

Oxime Sulfonate Chemistry for Advanced Microlithography

Yamamoto, Hitoshi, Asakura, Toshikage, Nishimae, Yuichi, Matsumoto, Akira, Tanabe, Junichi, Birbaum, Jean-Luc, Murer, Peter, Hinterman, Tobias, Ohwa, Masaki
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Volume:
20
Year:
2007
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.20.637
File:
PDF, 685 KB
english, 2007
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