Rejuvenation of 248nm Resist Backbones for 157nm...

Journal of Photopolymer Science and Technology 2001 Vol. 14; Iss. 4

Rejuvenation of 248nm Resist Backbones for 157nm Lithography.

Bae, Young C., Douki, Katsuji, Yu, Tianyue, Dai, Junyan, Schmaljohann, Dirk, Kang, Seok Ho, Kim, Keon Hyeong, Koerner, Hilmar, Conley, Will, Miller, Daniel, Balasubramanian, Raghu, Holl, Susan, Ober,
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Volume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.613
File:
PDF, 1.94 MB
english, 2001
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