Novel Diamantane Polymer Platform for Resist Applications

Journal of Photopolymer Science and Technology 2007 Vol. 20; Iss. 5

Novel Diamantane Polymer Platform for Resist Applications

Padmanaban, Murirathna, Chakrapani, Srinivasan, Lin, Guanyang, Kudo, Takanori, Parthasarathy, Deepa, Anyadiegwu, Clement, Antonio, Charito, Dammel, Ralph, Liu, Shenggao, Lam, Feederick, Maehara, Takay
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Volume:
20
Year:
2007
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.20.719
File:
PDF, 727 KB
english, 2007
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