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Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope(AFM.)
Kawai, Akira, Abe, TakatoVolume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.513
File:
PDF, 1.16 MB
english, 2001