157nm Single-Layer and Bilayer Resists Based on...

Journal of Photopolymer Science and Technology 2001 Vol. 14; Iss. 4

157nm Single-Layer and Bilayer Resists Based on .ALPHA.-Methylstyrene Polymers.

Shirai, Masamitsu, Shinozuka, Toyofumi, Okamura, Haruyuki, Tsunooka, Masahiro, Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru
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Volume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.621
File:
PDF, 1.70 MB
english, 2001
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