Development of High-Performance Negative-tone Resists for...

Journal of Photopolymer Science and Technology 2003 Vol. 16; Iss. 4

Development of High-Performance Negative-tone Resists for 193-nm Lithography

Hattori, Takashi, Yokoyama, Yoshiyuki, Kimura, Kaori, Yamanaka, Ryoko, Tanaka, Toshihiko, Fukuda, Hiroshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Year:
2003
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.16.489
File:
PDF, 1.51 MB
2003
Conversion to is in progress
Conversion to is failed