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Volume 16; Issue 4
Main
Journal of Photopolymer Science and Technology
Volume 16; Issue 4
Journal of Photopolymer Science and Technology
Volume 16; Issue 4
1
DFT Calculations of Photoabsorption Spectra for Alicyclic and Heterocyclic Compounds in the VUV Region
ANDO, Shinji
,
UEDA, Mitsuru
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.43 MB
Your tags:
2003
2
Strategies for High Transparency Acrylate Resists for 157 nm Lithography
Jakúbek, Vladimír
,
Liu, Xiang-Qian
,
Vohra, Vaishali R.
,
Douki, Katsuji
,
Kwark, Young-Je
,
Ober, Christopher K.
,
Markley, Thomas J.
,
Robertson III, Eric A.
,
Carr, Richard V.C.
,
Marsella, John A.
,
Conley
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.16 MB
Your tags:
2003
3
A New Photoresist Materials for 157nm Lithography-3: Poly [2-hydroxy-3-pinanyl vinyl sulfonate-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)styrene]
Iimori, H.
,
Ando, S.
,
Shibasaki, Y.
,
Ueda, M.
,
Kishimura, S.
,
Endo, M.
,
Sasago, M.
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 738 KB
Your tags:
2003
4
F2 Resist Based on Methacrylonitrile/2-Trifluoromethylacrylate Copolymers
Shirai, Masamitsu
,
Takashiba, Shinichi
,
Tsunooka, Masahiro
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 367 KB
Your tags:
2003
5
Advanced RELACS Technology for ArF Resist
Terai, Mamoru
,
Toyoshima, Toshiyuki
,
Ishibashi, Takeo
,
Tarutani, Shinji
,
Takahashi, Kiyohisa
,
Takano, Yusuke
,
Tanaka, Hatsuyuki
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 836 KB
Your tags:
2003
6
Improvement in 193 nm Photoresists Performance by 172 nm VUV Curing
Takeda, Kazuhiro
,
Asahara, Hirokazu
,
Hanawa, Tetsurou
,
Tsujita, Kouichirou
,
Okumura, Haruki
,
Hishinuma, Nobuyuki
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1001 KB
Your tags:
2003
7
A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography
Irie, Shigeo
,
Shigematsu, Masato
,
Sakamoto, Rikimaru
,
Mizusawa, Kenichi
,
Nakajima, Yasuyuki
,
Itani, Toshiro
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.36 MB
Your tags:
2003
8
The Evolution of Materials for the Photolithographic Process
Grant Willson, C.
,
Trinque, Brian C.
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.83 MB
Your tags:
2003
9
Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity
Padmanaban, Munirathna
,
Anyadiegwu, Clement
,
Kanda, Takashi
,
Kim, Woo-Kyu
,
Kudo, Takanori
,
McKenzie, Douglas
,
Rahman, Dalil
,
Dammel, Ralph
,
Lee, SangHo
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.60 MB
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2003
10
Fluoropolymer Resists: Progress and Properties
Ito, H.
,
Truong, H.D.
,
Okazaki, M.
,
DiPietro, R.A.
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.91 MB
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2003
11
Characterization of Fluoropolymer Resist for 157-nm Lithography
Hagiwara, Takuya
,
Irie, Shigeo
,
Itani, Toshiro
,
Kawaguchi, Yasuhide
,
Yokokoji, Osamu
,
Kodama, Shun-ichi
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.84 MB
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2003
12
Development of SSQ Based 157nm Photoresist
Hung, Raymond J.
,
Chiba, Takashi
,
Iwasawa, Haruo
,
Hayashi, Akihiro
,
Yamahara, Noboru
,
Shimokawa, Tsutomu
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.04 MB
Your tags:
2003
13
Tetrafluoroethylene-based Fluoropolymers for 157-nm Resist Materials
Toriumi, M.
,
Ishikawa, T.
,
Kodani, T.
,
Koh, M.
,
Moriya, T.
,
Araki, T.
,
Aoyama, H.
,
Yamashita, T.
,
Yamazaki, T.
,
Furukawa, T.
,
Itani, T.
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 940 KB
Your tags:
2003
14
Mechanical Properties of Poly-methyl methacrylate (PMMA) for Nano Imprint Lithography
Hirai, Yoshihiko
,
Yoshikawa, Takashi
,
Takagi, Nobuyuki
,
Yoshida, Satoshi
,
Yamamoto, Kazuhiro
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.09 MB
Your tags:
2003
15
Role of Bilayer Resist in 157 nm Lithography
Bowden, Murrae
,
Malik, Sanjay
,
Dilocker, Stephanie
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.40 MB
Your tags:
2003
16
Copolymers with Well-Controlled Molecular Weight and Low Polydispersity for 193 nm Photoresists
Lee, Ting-Yu
,
Yu, Chao-Ying
,
Hsu, Meei-Yu
,
Hayashi, R.
,
Iwai, T.
,
Chen, Jian-Hong
,
Ho, Bang-Ching
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 544 KB
Your tags:
2003
17
Development of High-Performance Negative-tone Resists for 193-nm Lithography
Hattori, Takashi
,
Yokoyama, Yoshiyuki
,
Kimura, Kaori
,
Yamanaka, Ryoko
,
Tanaka, Toshihiko
,
Fukuda, Hiroshi
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.51 MB
Your tags:
2003
18
ArF Bi-layer Resist for sub-90nm L/S Fabrication
Kim, Hyun-Woo
,
Hong, J.
,
Jung, Myung-Ho
,
Woo, Sang-Gyun
,
Cho, Han-Ku
,
Han, Woo-Sung
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.67 MB
Your tags:
2003
19
Introducing 157 nm Full Field Lithography
Goethals, A.M.
,
De Bisschop, P.
,
Hermans, J.
,
Jonckheere, R.
,
Van Roey, F.
,
Van den Heuvel, D.
,
Eliat, A.
,
Ronse, K.
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 2.62 MB
Your tags:
2003
20
New Fluorinated Resins for 157 nm Lithography Application
Houlihan, Francis
,
Romano, Andrew
,
Rentkiewicz, David
,
Sakamuri, Raj
,
Dammel, Ralph R.
,
Conley, Will
,
Rich, Georgia
,
Miller, Daniel
,
Rhodes, Larry
,
McDaniels, Joe
,
Chang, Chun
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 2.11 MB
Your tags:
2003
21
A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist
Kanna, Shinichi
,
Mizutani, Kazuyoshi
,
Yasunami, Shoichiro
,
Kawabe, Yasumasa
,
Tan, Shiro
,
Yagihara, Morio
,
Kokubo, Tadayoshi
,
Malik, Sanjay
,
Dilocker, Stephanie
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 1.34 MB
Your tags:
2003
22
Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis
Yamanaka, Ryoko
,
Gotoh, Yasushi
,
Tanaka, Toshihiko
Journal:
Journal of Photopolymer Science and Technology
Year:
2003
File:
PDF, 851 KB
Your tags:
2003
1
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