Optimization of Cu/Low-k Dual Damascene Post-Etch Residue...

Solid State Phenomena 2016 / 9 Vol. 255

Optimization of Cu/Low-k Dual Damascene Post-Etch Residue and TiN Hard Mask Removal

Kabansky, Alexander, Westwood, Glenn, Tan, Samantha, Kovacs, Frederic, Lou, David, Han, Joe, Delgadino, Gerardo, Chang, H.W.
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Volume:
255
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.255.237
Date:
September, 2016
File:
PDF, 828 KB
english, 2016
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