Volume 255

Solid State Phenomena

Volume 255

1

Progress in Cleaning and Wet Processing for Kesterite Thin Film Solar Cells

Vermang, Bart, Mule, Aniket, Gampa, Nikhil, Sahayaraj, Sylvester, Ranjbar, Samaneh, Brammertz, Guy, Meuris, Marc, Poortmans, Jef

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.01 MB

english, 2016

2

Study of Oxygen Concentration in TMAH Solution for Improvement of Sigma-Shaped Wet Etching Process

He, Yong Gen, Liu, Huan Xin, Liu, Jia Lei, Wu, Jin Gang, Haigermoser, Christian, Liu, Feng, Zhou, Mei Sheng, Lu, Wei

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 399 KB

english, 2016

3

The Effect of Rinsing a Germanium Surface after Wet Chemical Treatment

Yoshida, Yukifumi, Takahashi, Hiroaki, Sato, Masanobu, Snow, Jim, Sebaai, Farid, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.79 MB

english, 2016

4

Effect of Dilute Hydrogen Peroxide in Ultrapure Water on SiGe Epitaxial Process

Masaoka, Toru, Gan, Nobuko, Fujimura, Yu, Ogawa, Yuichi, Wostyn, Kurt, Pacco, Antoine, Yoshida, Yukifumi, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 556 KB

english, 2016

5

Wet Selective SiGe Etch to Enable Ge Nanowire Formation

Sebaai, Farid, Witters, Liesbeth, Holsteyns, Frank, Wostyn, Kurt, Rip, Jens, Yukifumi, Yoshida, Lieten, Ruben R., Bilodeau, Steven, Cooper, Emanuel

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 641 KB

english, 2016

6

Tris(Trimethylsilyl)Germane (Me3Si)3GeH: A Molecular Model for Sulfur Passivation of Ge(111) Surfaces

Okorn, Gilbert, Fischer, Roland, Steller, Beate, Engesser, Philipp, Okorn-Schmidt, Harald

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 787 KB

english, 2016

7

Applications for Surface Engineering Using Atomic Layer Etching - Invited Paper

Papalia, John, Marchack, Nathan, Bruce, Robert, Miyazoe, Hiroyuki, Engelmann, Sebastian, Joseph, Eric A.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 3.50 MB

english, 2016

8

Towards Atomic-Layer-Scale Processing of High Mobility Channel Materials in Acidic Solutions for N5 and N7 Technology Nodes

van Dorp, Dennis H., Arnauts, Sophia, Abrenica, Graniel, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 433 KB

english, 2016

9

Selective Etching of Silicon Oxide versus Nitride with Low Oxide Etching Rate

Wu, Hsing Chen, Tu, Sheng Hung, Yang, Min Chieh, Cooper, Emanuel

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.22 MB

english, 2016

10

Silicon Surface Passivation in HF Solutions for Improved Gate Oxide Reliability

Garnier, Philippe

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.86 MB

english, 2016

11

Quantitative Analysis of Trace Metallic Contamination on III-V Compound Semiconductor Surfaces

Saga, Koichiro, Ohno, Rikiichi

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.11 MB

english, 2016

12

Measurement of the Frictional Force between PVA Roller Brushes and Semiconductor Wafers with Various Films Immersed in Chemicals

Nishio, Kenya, Sanada, Toshiyuki, Hamada, Satomi, Hiyama, Hirokuni, Fukunaga, Akira

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 514 KB

english, 2016

13

Liquid Cell Platform to Directly Visualize Bottom-Up Assembly and Top-Down Etch Processes inside TEM

Aabdin, Zainul, Xu, Xiu Mei, Anand, Utkarsh, Holsteyns, Frank, Mirsaidov, Utkur

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 8.37 MB

english, 2016

14

Developments for Physical Cleaning Sample with High Adhesion Force Particles and Direct Measurement of its Removal Force

Tokuda, Emu, Sanada, Toshiyuki, Iwata, Futoshi, Takato, Chikako, Hiyama, Hirokuni, Fukunaga, Akira

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.26 MB

english, 2016

15

Characterization of Etch Residues Generated on Damascene Structures

Le, Quoc Toan, Kesters, Els, Hoflijk, I., Conard, T., Shen, M., Braun, S., Burk, Y., Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 394 KB

english, 2016

16

‘Just-Clean-Enough’: Optimization of Wet Chemical Cleaning Processes for Crystalline Silicon Solar Cells

Haslinger, Michael, Soha, M., Robert, S., Claes, M., Mertens, Paul W., John, J.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 632 KB

english, 2016

17

Middle of Line (MoL) Cleaning Challenges in Sub-20nm Node Device Manufacturing

Singh, Sherjang, Muralidhar, Pranesh, Mallabar, Samuel, Scott, Silas

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 952 KB

english, 2016

18

Removal of Bull’s Eye Signature by Optimizing Wet Cleans Recipe

Bhattacharyya, Dhiman, Muralidhar, Pranesh, Conrad, Mark

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 744 KB

english, 2016

19

Evaluation of Post Etch Residue Cleaning Solutions for the Removal of TiN Hardmask after Dry Etch of Low-k Dielectric Materials on 45 nm Pitch Interconnects

Payne, Makonnen, Lippy, Steven, Lieten, Ruben R., Kesters, Els, Le, Quoc Toan, Murdoch, Gayle, Gonzalez, Victor V., Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 3.32 MB

english, 2016

20

High Throughput Wet Etch Solution for BEOL TiN Removal

Hsu, Chia Jung, Wang, Chieh Ju, Tu, Sheng Hung, Payne, Makonnen, Cooper, Emanuel, Lippy, Steven

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 237 KB

english, 2016

21

Comparison of the Chemical Passivation of GaAs, In0.53Ga0.47As, and InSb with 1-Eicosanethiol

Contreras, Yissel, Mancheno-Posso, Pablo, Muscat, Anthony J.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 665 KB

english, 2016

22

Low Undercut Ti Etch Chemistry for Cu Bump Pillar under Bump Metallization Wet Etch Process

Capecchi, Simone, Atanasova, Tanya, Willeke, Reiner, Parthenopoulos, Michael, Pizzetti, Christian, Daviot, Jerome

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 628 KB

english, 2016

23

Study on the Etching Selectivity of Oxide Films in Dry Cleaning Process with NF3 and H2O

Kang, Sung Min, Kim, Tae Hyung, Kim, Tae Sung

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 664 KB

english, 2016

24

Titanium Nitride Hard Mask Removal with Selectivity to Tungsten in FEOL

Wu, Hsing Chen, Tu, Sheng Hung, Yang, Min Chieh, Cooper, Emanuel

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 274 KB

english, 2016

25

Study of TiW Conditioning through Different Wet and Dry Treatments to Promote Ni Electroless Growth

Venegoni, Ivan, Scimè, Fabio, Ravizza, Enrica, Spadoni, Simona, Pipia, Francesco, Colpani, Paolo, Alessandri, Mauro

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 3.33 MB

english, 2016

26

Surface Preparation Quality before Epitaxy our Paper's

Garnier, Philippe

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 3.57 MB

english, 2016

27

Watermark-Free and Efficient Spray Clean on Hydrophobic Surface with Single-Wafer Technology

Belmiloud, N., Kenkare, N.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.56 MB

english, 2016

28

Minimizing Wafer Surface Charging for Single-Wafer Wet Cleaning for 10 nm and beyond

Sano, Ken-Ichi, Dylewicz, Rafal, Man, Xia, Mui, David, Zhu, Ji, Kawaguchi, Mark

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.27 MB

english, 2016

29

Metal Removal Efficiency in High Aspect Ratio Structures

Garnier, Philippe, Fontaine, Hervé

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 5.13 MB

english, 2016

30

A Mathematical Model Forecasting HF Adsorption onto Cu-Coated Wafers as a Function of the Airborne Concentration and Moisture

Herrán, Fernando, Fontaine, Hervé, González-Aguirre, Paola, Beitia, Carlos, Ohlsen, Jim, Lundgren, Jorgen

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.30 MB

english, 2016

31

Oxidation of Si Surfaces: Effect of Ambient Air and Water Treatments on Surface Charge and Interface State Density

Angermann, Heike, Balamou, Patrice, Lu, Wen Jia, Korte, Lars, Leendertz, Caspar, Stegemann, Bert

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 401 KB

english, 2016

32

Surface Optimization of Random Pyramid Textured Silicon Substrates for Improving Heterojunction Solar Cells

Stegemann, Bert, Kegel, Jan, Korte, Lars, Angermann, Heike

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 811 KB

english, 2016

33

Contamination Control for Wafer Container Used within 300 mm Manufacturing for Power Microelectronics

Schneider, Germar, Nguyen, Thi Quynh, Taubert, Matthias, Bounouar, Julien, Le-Guet, Catherine, Leibold, Andreas, Richter, Helene, Pfeffer, Markus

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 628 KB

english, 2016

34

Digital Etching of GaAs Materials: Comparison of Oxidation Treatments

Rebaud, Mickaël, Roure, Marie Christine, Enyedi, Virginie, Borowik, Lukasz, Martinez, Eugénie, Toselli, Laura, Besson, Pascal

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.78 MB

english, 2016

35

Inline FOUP Cleaner - The New Type FOUP Cleaner for the Next Generation

Gwon, Sa Gong, Lee, Kwang Bong, Lee, Byoung Jun, Choi, Geun Min

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 553 KB

english, 2016

36

Molecular Simulation Contribution to Porous Low-k Pore Size Determination after Damage by Etch and Wet Clean Processes - Invited Paper

Broussous, Lucile, Lépinay, Matthieu, Coasne, Benoit, Licitra, Christophe, Bertin, François, Rouessac, Vincent, Ayral, André

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1008 KB

english, 2016

37

Post CMP Wet Cleaning Influence on Cu Hillocks

Votta, Annamaria, Pipia, Francesco, Livellara, Luisito, Caminati, Manuela, Spadoni, Simona, Ravizza, Enrica, Grasso, Salvatore, Bollin, Maddalena, Moroni, Maurizio, Alessandri, Mauro, Colpani, Paolo

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1017 KB

english, 2016

38

Electrical Characterization of As-Processed Semiconductor Surfaces - Invited Paper

Ruzyllo, Jerzy, Drummond, Patrick J.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.11 MB

english, 2016

39

Rapid Recovery Process of Plasma Damaged Porous Low-k Dielectrics by Wet Surface Modifying Treatment

Iwasaki, Akihisa, Higuchi, Ayumi, Komori, Kana, Sato, Masanobu, Kesters, Els, Le, Quoc Toan, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 378 KB

english, 2016

40

Optimization of Cu/Low-k Dual Damascene Post-Etch Residue and TiN Hard Mask Removal

Kabansky, Alexander, Westwood, Glenn, Tan, Samantha, Kovacs, Frederic, Lou, David, Han, Joe, Delgadino, Gerardo, Chang, H.W.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 828 KB

english, 2016

41

Impact of Dissolved Oxygen in Dilute HF Solution on Material Etch

Kesters, Els, Iwasaki, Akihisa, Le, Quoc Toan, Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 829 KB

english, 2016

42

Oxygen Control for Wet Clean Process on Single Wafer Platform

Broussous, Lucile, Hoarau, Kevin, de Buttet, Come, Zoll, Stephane

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.62 MB

english, 2016

43

Characterization and Development of High Dose Implanted Resist Stripping Processes

Croisy, Marion, Jenny, Cécile, Richard, Claire, Guiheux, Denis, Campo, Alain, Pargon, Erwine, Possémé, Nicolas

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 4.13 MB

english, 2016

44

Toward CO2 Beam Cleaning of 20-nm Particles in Atmospheric Pressure

Kim, Joo Noh, Lee, Jae Hong, Kim, Seung Ho, Kim, Jin Kyu, Choi, Ki Hoon, Kim, Ho Young

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 527 KB

english, 2016

45

Atomic Resolution Quality Control for Fin Oxide Recess by Atomic Resolution Profiler

Kim, Tae Gon, Ryu, Heon Yul, Kenis, Karine, Jo, Ah Jin, Cho, Sang Joon, Park, Sang Il, Schmidt, Sebastian, Irmer, Bernd

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.09 MB

english, 2016

46

Ultra-Trace Sulfate Ion Removal on Photomasks for Haze Reduction

Guo, Eric, Wang, Crystal, Qian, Sandy, Wang, Mars, Zhang, Harry, Wu, Keanu, Shen, Jian, Jiang, Wei, Xu, Fei

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 644 KB

english, 2016

47

Electrolyzed Water for Efficient Metal Removal

Oshinowo, John, Neelsen, Ann Kristine, Fryda, Matthias, Rebstock, Lutz, Quarti, Ulrich

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.04 MB

english, 2016

48

Thin Layer Etching of Silicon Nitride: Comparison of Downstream Plasma, Liquid HF and Gaseous HF Processes for Selective Removal after Light Ion Implantation

Pollet, Olivier, Possémé, Nicolas, Ah-Leung, Vincent, Garcia Barros, Maxime

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 523 KB

english, 2016

49

Analysis of Si Wet Etching Effect on Wafer Edge

Saito, Suguru, Okuyama, Atsushi, Takeo, Kenji, Hagimoto, Yoshiya, Iwamoto, Hayato

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 734 KB

english, 2016

50

Efficient Photoresist Residue Removal with 172nm Excimer Radiation

Schäfert, Andreas, Wiesmann, Hartwig

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 599 KB

english, 2016

51

TiN Metal Hardmask Etch Residues Removal with AlN Etch

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 388 KB

english, 2016

52

Metrology for High Selective Silicon Nitride Etch

Bai, Chuan Nan, Liang, Guang, Shalyt, Eugene

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 267 KB

english, 2016

53

A Study on the Electrostatic Discharge (ESD) Defect in SOH Mask Pattern Cleaning

Ko, Dae Wan, Hwang, Tae Ho, Han, Sok Hyung, Kim, Chang Hyun, Ryu, Byung Sul

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 621 KB

english, 2016

54

Advanced Cryogenic Aerosol Cleaning: Small Particle Removal and Damage-Free Performance

Mbanaso, Chimaobi, Butterbaugh, Jeffery W., Becker, David Scott, Printz, Wallace P., Rotondaro, Antonio L.P., Bassett, Derek W., Thomes, Gregory P., Schwab, Brent D., Rathman, Christina Ann, Lauerhaas

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 6.56 MB

english, 2016

55

Post-CMP Cleaners for Tungsten at Advanced Nodes

Lieten, Ruben R., White, Daniela, Parson, Thomas, Jenq, Shi Ning, Frye, Don, White, Michael, Teugels, Lieve, Struyf, Herbert

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 4.20 MB

english, 2016

56

Optimization of EUV Reticle Cleaning by Evaluation of Chemistries on Wafer-Based Mimic Test Structures

Pacco, Antoine, Dattilo, D., Jonckheere, R., Rip, Jens, Dietze, U., Kruemberg, J., Holsteyns, Frank

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 3.52 MB

english, 2016

57

Surface Passivation of New Channel Materials Utilizing Hydrogen Peroxide and Hydrazine Gas

Alvarez Jr, Dan, Spiegelman, Jeffrey J., Kummel, Andrew C., Edmonds, Mary, Sardashti, Kasra, Wolf, Steven, Holmes, Russell

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 705 KB

english, 2016

58

The Effect of Inhibitors on Co Corrosion in Alkaline Post Cu-CMP Cleaning Solutions

Hsu, Ping, Bernatis, Paul R., Huang, Kevin, Yen, Chi

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 618 KB

english, 2016

59

Chemical Infiltration through Deep UV Photoresist

Garnier, Philippe, Neyens, Marc

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 2.88 MB

english, 2016

60

Pattern Collapse of High-Aspect-Ratio Silicon Nanostructures - A Parametric Study

Vrancken, Nandi, Vereecke, Guy, Bal, Stef, Sergeant, Stefanie, Doumen, Geert, Holsteyns, Frank, Terryn, Herman, de Gendt, Stefan, Xu, Xiu Mei

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.04 MB

english, 2016

61

Influence of CO2 Gas Atmosphere on the Liquid Filling of Superhydrophobic Nanostructures

Vereecke, Guy, Debruyn, Haroen, Xu, Xiu Mei, Holsteyns, Frank, de Gendt, Stefan

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 409 KB

english, 2016

62

Characterization of Cavitation in a Single Wafer or Photomask Cleaning Tool

Chen, Xi, Yam, Petrie, Keswani, Manish, Okada, Nagaya, Zanelli, Claudio I.

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 888 KB

english, 2016

63

Specification of Trace Metal Contamination for Image Sensors

Mertens, Paul W., Lavizzari, Simone, Guerrieri, Stefano

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 208 KB

english, 2016

64

Extended-Nanofluidic Devices and the Unique Liquid Properties - Invited Paper

Mawatari, Kazuma, Kitamori, Takehiko

Journal:

Solid State Phenomena

Year:

2016

File:

PDF, 1.81 MB

2016

65

Extended-Nanofluidic Devices and the Unique Liquid Properties - Invited Paper

Mawatari, Kazuma, Kitamori, Takehiko

Journal:

Solid State Phenomena

Year:

2016

Language:

english

File:

PDF, 1.81 MB

english, 2016

66

172 nm Excimer Radiation as a Technology Accelerator for Bio-Electronic Applications

Schäfert, Andreas, Wiesmann, Hartwig

Journal:

Solid State Phenomena

Year:

2016

File:

PDF, 770 KB

2016

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