On the spatial resolution limit of direct-write electron...

Microelectronic Engineering 2017 / 01 Vol. 168

On the spatial resolution limit of direct-write electron beam lithography

Jiang, Nan
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Volume:
168
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.10.016
Date:
January, 2017
File:
PDF, 384 KB
english, 2017
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