Consecutive imprinting performance of large area UV...

Microelectronic Engineering 2017 / 05 Vol. 176

Consecutive imprinting performance of large area UV nanoimprint lithography using Bi-layer soft stamps in ambient atmosphere

Si, Shuhao, Hoffmann, Martin
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Volume:
176
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2017.01.032
Date:
May, 2017
File:
PDF, 3.97 MB
english, 2017
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