Alternative to H3PO4 for Si3N4 Removal by Using Chemical Downstream Etching
de Buttet, C., Gourhant, O., Bouyssou, R., Zoll, S.Volume:
64
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/06439.0001ecst
Date:
April, 2015
File:
PDF, 1.24 MB
english, 2015