In-Die Through-BEOL Metal Wall for Noise Isolation in 180-nm FD-SOI CMOS
Lu, Fei, Chen, Qi, Wang, Chenkun, Zhang, Feilong, Li, Cheng, Ma, Rui, Shawn Wang, X., Wang, AlbertVolume:
38
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2017.2682819
Date:
May, 2017
File:
PDF, 787 KB
english, 2017