Novel one-component molecular glass photoresist based on...

Novel one-component molecular glass photoresist based on cyclotriphosphazene containing t-butyloxy carbonyl group for i-line lithography

Li, Hu, Zhou, Zhen, Liu, Jingcheng, Zheng, Xiangfei, Xu, Wenjia, Ji, Changwei, Shi, Weidong, Liu, Ren, Liu, Xiaoya
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
24
Language:
english
Journal:
Journal of Polymer Research
DOI:
10.1007/s10965-017-1221-8
Date:
April, 2017
File:
PDF, 1.14 MB
english, 2017
Conversion to is in progress
Conversion to is failed