Novel one-component molecular glass photoresist based on cyclotriphosphazene containing t-butyloxy carbonyl group for i-line lithography
Li, Hu, Zhou, Zhen, Liu, Jingcheng, Zheng, Xiangfei, Xu, Wenjia, Ji, Changwei, Shi, Weidong, Liu, Ren, Liu, XiaoyaVolume:
24
Language:
english
Journal:
Journal of Polymer Research
DOI:
10.1007/s10965-017-1221-8
Date:
April, 2017
File:
PDF, 1.14 MB
english, 2017