Photoetching method that provides improved...

Microelectronic Engineering 2017 / 08 Vol. 180

Photoetching method that provides improved silicon-on-insulator layer thickness uniformity in a defined area

Miyata, Yuki, Nakamukai, Yasunori, Azevedo, Cassia Tiemi, Morita, Miho, Uchikoshi, Junichi, Kawai, Kentaro, Arima, Kenta, Morita, Mizuho
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Volume:
180
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2017.06.008
Date:
August, 2017
File:
PDF, 526 KB
english, 2017
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