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High-temperature and humidity change the microstructure and degrade the material properties of tin‑silver interconnect material
Gain, Asit Kumar, Zhang, LiangchiVolume:
83
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2018.02.022
Date:
April, 2018
File:
PDF, 2.04 MB
english, 2018