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Evaluation of SF6 Reactive Ion Etching Performance with a Permanent Magnet Located behind the Substrate based on a Simple Design Concept
MOTOMURA, Taisei, TAKAHASHI, Kazunori, KASASHIMA, Yuji, Kikunaga, Kazuya, UESUGI, Fumihiko, ANDO, AkiraVolume:
59
Year:
2016
Language:
english
Journal:
Journal of the Vacuum Society of Japan
DOI:
10.3131/jvsj2.59.11
File:
PDF, 974 KB
english, 2016