Thermal conductivity and thermal boundary resistance of atomic layer deposited high- k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon
Scott, Ethan A., Gaskins, John T., King, Sean W., Hopkins, Patrick E.Volume:
6
Language:
english
Journal:
APL Materials
DOI:
10.1063/1.5021044
Date:
May, 2018
File:
PDF, 447 KB
english, 2018