DEVICE CHARACTERISATION OF A HIGH DENSITY HALF-MICRON CMOS...

Le Journal de Physique Colloques 1988 / 09 Vol. 49; Iss. C4

DEVICE CHARACTERISATION OF A HIGH DENSITY HALF-MICRON CMOS PROCESS

WOERLEE, P. H., JUFFERMANS, C. A.H., LIFKA, H., WALKER, A. J., POORTER, T., MERKS-EPPINGBROEK, H. J.H., OUDE LANSINK, F. M.
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Volume:
49
Journal:
Le Journal de Physique Colloques
DOI:
10.1051/jphyscol:1988405
Date:
September, 1988
File:
PDF, 1.65 MB
1988
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