Influence of mask substrate materials on resist sidewall...

Microsystem Technologies 2008 / 02 Vol. 14; Iss. 2

Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography

G. Aigeldinger, C.-Y. P. Yang, D. M. Skala, D. H. Morse, A. A. Talin, S. K. Griffiths, J. T. Hachman, J. T. Ceremuga
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Volume:
14
Language:
english
Pages:
10
DOI:
10.1007/s00542-007-0419-9
Date:
February, 2008
File:
PDF, 576 KB
english, 2008
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