Study on microstructural, chemical and electrical...

Microsystem Technologies 2010 / 05 Vol. 16; Iss. 5

Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering

Michaela Grosser, M. Münch, J. Brenner, M. Wilke, H. Seidel, C. Bienert, A. Roosen, U. Schmid
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Volume:
16
Language:
english
Pages:
12
DOI:
10.1007/s00542-009-0993-0
Date:
May, 2010
File:
PDF, 396 KB
english, 2010
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