Improved process flow for buried channel fabrication in...

Microsystem Technologies 2012 / 03 Vol. 18; Iss. 3

Improved process flow for buried channel fabrication in silicon

Z. Fekete, A. Pongrácz, P. Fürjes, G. Battistig
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Volume:
18
Language:
english
Pages:
6
DOI:
10.1007/s00542-012-1430-3
Date:
March, 2012
File:
PDF, 333 KB
english, 2012
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