Application of deep reactive ion etching for silicon...

Application of deep reactive ion etching for silicon angular rate sensor

J. Choi, K. Minami, M. Esashi
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Volume:
2
Language:
english
Pages:
5
DOI:
10.1007/s005420050042
Date:
October, 1996
File:
PDF, 803 KB
english, 1996
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