Effect of concentration change of 0.1% triton added 25 wt%...

Microelectronic Engineering 2020 / 04 Vol. 227

Effect of concentration change of 0.1% triton added 25 wt% TMAH during fabrication of deep cavities with mesa structures in SOI wafer

Menon, P. Krishna, Ashok, Akarapu, Rao, A.V. Narasimha, Pandey, Ashok Kumar, Pal, Prem
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Volume:
227
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2020.111323
Date:
April, 2020
File:
PDF, 1.47 MB
2020
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