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Study on effect of complexing agents on Co oxidation/dissolution for chemical-mechanical polishing and cleaning process
Kwon, Ohsung, Bae, KiHo, Byun, Jinuk, Lim, Taeho, Kim, Jae JeongVolume:
227
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2020.111308
Date:
April, 2020
File:
PDF, 1.34 MB
2020