PLASMA ANODISATION OF SILICON FOR ADVANCED VLSI

TAYLOR, S., ECCLESTON, W., RINGNALDA, J., MAHER, D. M., EAGLESHAM, D. J., HUMPHREYS, C. J., GODFREY, D. J.

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Volume:

Journal:

Le Journal de Physique Colloques

DOI:

10.1051/jphyscol:1988482

Date:

September, 1988

File:

PDF, 1.84 MB

1988

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