Surface chemistry of a new III–V MOCVD reactant: PhAsH2 on GaAs(100)
A. Schütze, J. Zacheja, M. Weyers, D. KohlVolume:
107
Year:
1991
Language:
english
Pages:
2
DOI:
10.1016/0022-0248(91)90598-y
File:
PDF, 134 KB
english, 1991