![](/img/cover-not-exists.png)
Silicon monolayer growth using dichlorosilane and hydrogen in a near atmospheric pressure chemical vapor deposition reactor
F.G. McIntosh, P.C. Colter, S.M. BedairVolume:
225
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(93)90152-f
File:
PDF, 354 KB
english, 1993