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Electrical and structural properties of buried CoSi2 layers in Si(100) grown by molecular beam allotaxy
M. Dolle, U. Gassig, H.L. Bay, A. Schüppen, S. MantlVolume:
253
Year:
1994
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(94)90371-9
File:
PDF, 419 KB
english, 1994