Effect of Ar gas pressure on growth, structure, and mechanical properties of sputtered Ti, Al, TiAl, and Ti3Al films
M. Chinmulgund, R.B. Inturi, J.A. BarnardVolume:
270
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(95)06990-9
File:
PDF, 395 KB
english, 1995