Experimental verification of the impact of mosfet series resistance on device miniaturization down to source-drain areas as small as 0.2 μm by 0.3 μm
Asanga H. Perera, J. Peter KrusiusVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90073-3
File:
PDF, 318 KB
english, 1990