Patterning of 0.1 μm polysilicon lines by using a negative electron beam resist
J. Barrier, J.P. Miéville, M. Dutoit, Y. Oppliger, J.M. Moret, A. PerretVolume:
11
Year:
1990
Language:
english
Pages:
4
DOI:
10.1016/0167-9317(90)90086-9
File:
PDF, 356 KB
english, 1990