Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm
K. Early, M.L. Schattenburg, Henry I. SmithVolume:
11
Year:
1990
Language:
english
Pages:
5
DOI:
10.1016/0167-9317(90)90122-a
File:
PDF, 411 KB
english, 1990