Possibilities and limits of high speed e-beam submicron lithography
K.D. van der Mest, J.E. Barth, E.H. MulderVolume:
11
Year:
1990
Language:
english
Pages:
7
DOI:
10.1016/0167-9317(90)90123-b
File:
PDF, 476 KB
english, 1990