In situ strain control during MOCVD growth of high-quality...

Journal of Crystal Growth 2004 Vol. 261; Iss. 2-3

In situ strain control during MOCVD growth of high-quality InP-based long wavelength distributed Bragg reflectors

Richard W. Hoffman Jr., Michael Murphy, Jonathan Cruel, Michael Belousov, Boris Volf, Chris Murray, Eric A. Armour
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Volume:
261
Year:
2004
Language:
english
Pages:
8
DOI:
10.1016/j.jcrysgro.2003.11.042
File:
PDF, 420 KB
english, 2004
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