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Effect of N2 anneal on thin HfO2 layers studied by conductive atomic force microscopy
J Pétry, W Vandervorst, X BlascoVolume:
72
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2003.12.032
File:
PDF, 343 KB
english, 2004