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Fabrication of ultra-thin-film SOI transistors using the recessed channel concept
L. Dreeskornfeld, J. Hartwich, F. Hofmann, J. Kretz, E. Landgraf, R.J. Luyken, W. Rösner, R. Schröter, T. Schulz, M. Specht, M. Städele, W. Weber, L. RischVolume:
78-79
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2004.12.030
File:
PDF, 266 KB
english, 2005