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The mechanism of the ion beam inhibited etching formation in Gallium-FIB implanted resist films
Khalil Arshak, Miroslav Mihov, Shohei Nakahara, Arous Arshak, Declan McDonaghVolume:
78-79
Year:
2005
Language:
english
Pages:
8
DOI:
10.1016/j.mee.2004.12.091
File:
PDF, 296 KB
english, 2005